TECHNICAL OPERATION

The NanoStreamS source uses a modified DC sputtering source to generate a vapour from a metal target (such as a copper disk). Through careful management of the pressure, plasma temperature and flow rate of the gas mixture to the exit of the source, the vapour condenses into nanoparticles, much like droplet formation in clouds. Upon exiting the source, the growth of the nanoparticles is abruptly terminated resulting in a beam of particles with a very well-defined size-distribution of +/- 20% FWHM which can be further refined using an in-line mass filter specifically designed for very high masses.

FLEXIBILITY

The particles are largely ionised (negatively charged) which allows them to be manipulated electrostatically. This feature gives the user a further parameter to modify the resulting film properties by varying the impact energy of the particles. At low energy (no acceleration) the particles soft-land, retaining their natural shape. With small acceleration the particles bond with each other and the coating surface on impact but still largely retain their shape, resulting in a highly porous but stable layer. On increasing the acceleration the film becomes progressively more dense until, at very high energy, the particles deform and mix to such an extent that a bulk layer is formed with excellent adhesion. Making the instrumentation extremely flexible in line with your application requirements.